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Single-electron charging effects and implications for tunneling measurements of the high-T/sub c/ superconductors

机译:单电子电荷效应及其对高T / sub c /超导体隧穿测量的影响

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A theory is presented for the dynamics of two voltage-biased ultra-small capacitance tunnel junctions connected in series when one or more electrodes are superconducting, and experiments performed on parallel arrays of such junctions are reported. Using the semiclassical model, the authors find that the I-V characteristics display steps and therefore multiple peaks in dI/dV, corresponding to the time-average occupation of the interjunction region by integral numbers of electrons. The voltage at which the first step is located depends on the superconducting gap and the capacitances of the junctions. The spacing between subsequent steps depends solely on the capacitances. A discussion is presented of electron tunneling results performed on metal/Al/sub 2/O/sub 3//2-10 nm-diameter metal particles/Al/sub 2/O/sub 3//metal junctions where this multiple-peak structure is observed. The authors present preliminary tunneling results in junctions using Pb-particles. These results indicate that the multiple-peak structure commonly observed in tunneling data of high-T/sub c/ oxide superconductors can be explained in terms of charging effects in a material with a single superconducting gap.
机译:针对一个或多个电极超导时串联连接的两个电压偏置的超小电容隧道结的动力学,提出了一种理论,并报道了在这种结的并联阵列上进行的实验。使用半经典模型,作者发现I-V特性显示出阶跃,因此在dI / dV中出现多个峰,这对应于结点区域被电子的整数所占据的时间平均。第一步所处的电压取决于超导间隙和结的电容。后续步骤之间的间距仅取决于电容。讨论了在金属/ Al / sub 2 / O / sub 3 // 2-10 nm直径的金属颗粒/ Al / sub 2 / O / sub 3 //金属结上执行电子隧穿结果的问题观察到结构。作者介绍了使用Pb颗粒的结的初步隧穿结果。这些结果表明,在高T / sub c /氧化物超导体的隧穿数据中通常观察到的多峰结构可以用具有单个超导间隙的材料中的电荷效应来解释。

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