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Magnetoresistance in Co-Ag multilayers and granular films produced by electrodeposition method

机译:电沉积法制备的Co-Ag多层膜和颗粒膜中的磁阻

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摘要

Giant magnetoresistance (GMR) in Co-Ag multilayers and granular films produced by electrodeposition have been investigated. The Co-Ag alloy films have an fcc structure for the full range of compositions and no Co and Ag solid solution is formed. The deposition current density influences the magnetoresistance of Co-Ag single layer films giving a maximum magnetoresistance of 5% for a Co/sub 32/Ag/sub 68/ alloy film deposited at a current density of 10 mA/cm/sup 2/, measured at room temperature and within a 21 kOe field. GMR has also been observed for Co-Ag multilayer films. Co/sub rich//Ag/sub rich/ multilayer films show magnetoresistance values of 8.7% at room temperature and within a 21 kOe magnetic field.
机译:已经研究了通过电沉积产生的Co-Ag多层膜和颗粒膜中的巨磁阻(GMR)。 Co-Ag合金膜在整个组成范围内均具有fcc结构,且未形成Co和Ag固溶体。沉积电流密度会影响Co-Ag单层膜的磁阻,对于以10 mA / cm / sup 2 /的电流密度沉积的Co / sub 32 / Ag / sub 68 /合金膜,最大磁阻为5%。在室温和21 kOe场内测量。还已经观察到Co-Ag多层膜的GMR。富钴/富硒//银/富硒/多层膜在室温和21 kOe磁场下的磁阻值为8.7%。

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