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首页> 外文期刊>Magnetics, IEEE Transactions on >Domain Wall Propagation in Co-Based Glass-Coated Microwires: Effect of Stress Annealing and Tensile Applied Stresses
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Domain Wall Propagation in Co-Based Glass-Coated Microwires: Effect of Stress Annealing and Tensile Applied Stresses

机译:钴基玻璃包覆微丝中的畴壁传播:应力退火和拉伸应力的影响

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摘要

We report our recent results on studies of the effect of magnetic anisotropy induced by stress annealing on the domain wall (DW) dynamics of Co-rich microwires. We observed that the DW velocity of nearly zero magnetostrictive glass-coated microwires can be enhanced either by stress annealing of Co-rich microwires or even under applied tensile stresses to the annealed samples.
机译:我们报告了我们的最新结果,研究应力退火引起的磁各向异性对富钴微丝的畴壁(DW)动力学的影响。我们观察到,可通过富钴微丝的应力退火或什至在对退火样品施加拉应力的情况下,提高几乎零磁致伸缩玻璃涂层微丝的DW速度。

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