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首页> 外文期刊>IEEE Photonics Technology Letters >High-power 1.3-/spl mu/m InGaAsP-InP amplifiers with tapered gain regions
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High-power 1.3-/spl mu/m InGaAsP-InP amplifiers with tapered gain regions

机译:具有锥形增益区域的大功率1.3- / splμ/ m InGaAsP-InP放大器

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摘要

Tapered structures fabricated in InGaAsP-InP 1.3-/spl mu/m quantum-well material have been evaluated as high-gain high-saturation-power amplifiers. The devices, which had a 1-mm-long ridge-waveguide input gain section followed by a 2-mm-long tapered section, demonstrated an unsaturated gain of 26 dB at 2.0 A and about 30 dB at 2.8 A. Saturated output power at 2.8 A was <750 mW. At 2.0-A drive current and /spl ap/10-mW input power, the relative intensity noise of the amplified signal was /spl les/-160 dB/Hz at frequencies /spl ges/2 GHz.
机译:以InGaAsP-InP 1.3- / splμm/ m量子阱材料制造的锥形结构已被评估为高增益高饱和功率放大器。该器件具有一个1毫米长的脊形波导输入增益部分,然后是一个2毫米长的锥形部分,在2.0 A时表现出26 dB的不饱和增益,在2.8 A时表现出30 dB的不饱和增益。 2.8 A为<750 mW。在2.0A驱动电流和/ spl ap / 10-mW输入功率下,在/ spl ges / 2 GHz频率下,放大信号的相对强度噪声为/ spl les / -160 dB / Hz。

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