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首页> 外文期刊>IEEE journal of selected topics in quantum electronics >Densely arrayed eight-wavelength semiconductor lasers fabricated bymicroarray selective epitaxy
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Densely arrayed eight-wavelength semiconductor lasers fabricated bymicroarray selective epitaxy

机译:微阵列选择性外延制造的密集排列八波长半导体激光器

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This paper describes a novel epitaxial growth technique, callednmicroarray selective epitaxy (MASE), for fabricating extremely smallnintegrated photonic devices. The MASE technique makes it possible tonform densely arrayed (pitch <10 Μm) multiple-quantum-well (MQW)nwaveguides without semiconductor etching as well as to control thenbandgap energy of each waveguide. The technique is demonstrated fornfabricating an eight-channel 10-Μm-spacing microarray MQW structure,nand the bandgap wavelength of each channel is successfully controlled bynchanging the SiO2 mask pattern over a range of 90 nm. Thentechnique is also applied to the fabrication of densely arrayed,neight-wavelength, Fabry-Perot laser diodes. The laser section is only 70npm wide and 400 Μm long. Eight different lasing wavelengths (eachnover 80 nm), a uniform threshold current of less than 9 mA, and annoutput power of over 10 mW are obtained
机译:本文介绍了一种新颖的外延生长技术,称为微阵列选择性外延(MASE),用于制造极小的集成光子器件。 MASE技术使得无需半导体刻蚀就可以形成密集排列(节距<10微米)的多量子阱(MQW)n波导,并且无需控制每个波导的带隙能量。证明了该技术可用于制造八通道10微米间距的微阵列MQW结构,并且通过在90 nm范围内改变SiO2掩模图案可成功控制每个通道的带隙波长。然后,该技术也被用于制造密集排列的八波长法布里-珀罗激光二极管。激光部分的宽度仅为70npm,长度为400μm。获得八种不同的激光波长(每个波长80 nm),均匀的阈值电流小于9 mA,输出功率大于10 mW

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