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Analytical Framework for the Steady State Analysis of Wavelength-Dependent and Intensity-Dependent Interaction of Multiple Monochromatic Beams in Semiconductor Photonic Structures With Multiple Active and Passive Sections

机译:具有多个主动和被动截面的半导体光子结构中多个单色光束的波长相关和强度相关相互作用的稳态分析的分析框架

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The design, optimization, and parametric studies of photonic integrated circuits typically require steady state optical field profiles. Previously, a planewave-based eigenmode expansion and mode-matching analysis was shown to be an efficient method in calculating the steady-state optical field profile of a monochromatic beam in 2-D/3-D geometries with passive media. In this paper, we extend this approach for steady state analyses of photonic integrated circuits with both passive as well as active media, by enabling the interaction of multiple monochromatic beams with the medium via a self-consistent solution of the Maxwell's equations and a modified Bloch equations-based analytical framework. Through the Bloch equations-based framework, we treat the active medium as an ensemble of two-level Bloch atoms with varying density of states to characterize the bandstructure of semiconductors. This enables us to track carrier transitions between conduction and valence bands induced by the light–matter interaction over the entire bandwidth of excited carriers, and yield the correct quasi equilibrium Fermi–Dirac distributions. The numerical solution of obtaining the carrier distributions at each spatial location in active media is simplified by reducing the modified Bloch equations with multiple unknowns to a single equation with just one unknown, to enhance the computational efficiency of the approach. The calculated carrier distributions are then used to evaluate the spatial profile of the complex refractive index seen by each monochromatic beam along with its optical field profile. The applicability of the method to 2-D structures of complex geometry is demonstrated by obtaining the spatial profiles of refractive indices seen by two simultaneously interacting monochromatic beams along with their optical field profiles in a waveguide with multiple passive and active sections.
机译:光子集成电路的设计,优化和参数研究通常需要稳态光场轮廓。以前,基于平面波的本征模展开和模式匹配分析被证明是一种计算具有被动介质的2-D / 3-D几何形状中单色光束的稳态光场轮廓的有效方法。在本文中,我们通过Maxwell方程的自洽解和改进的Bloch启用了多个单色光束与介质的相互作用,从而将这种方法扩展到用于无源和有源介质的光子集成电路的稳态分析。基于方程的分析框架。通过基于Bloch方程的框架,我们将活性介质视为具有不同状态密度的两级Bloch原子的集合,以表征半导体的能带结构。这使我们能够跟踪在激发载流子整个带宽上由光-物质相互作用引起的导带和价带之间的载流子跃迁,并产生正确的准平衡费米-狄拉克分布。通过将具有多个未知数的修改后的Bloch方程简化为只有一个未知数的单个方程,简化了在有源介质中获得载流子分布的数值解决方案,从而提高了该方法的计算效率。然后将计算出的载流子分布用于评估每个单色光束看到的复折射率的空间分布及其光场分布。通过获得两个同时相互作用的单色光束及其在具有多个无源和有源部分的波导中的光场轮廓所获得的折射率的空间轮廓,证明了该方法对复杂几何形状的二维结构的适用性。

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