The resonant ATR (attenuated total reflectance) approach to semiconductor diagnostics and its application to the depth-profiling of multilayer structures

摘要

The resonant ATR spectroscopy (attenuated total reflectance) approach is discussed as a way to enhance the sensitivity of optical measurements through the excitation of resonant modes. In particular, the application of the method to the depth profiling of a multilayer structure is considered. After reviewing some results which illustrate the sensitivity of the technique, its transfer to a manufacturing environment is discussed. Finally, preliminary wavelength ATR spectra which allow the simultaneous determination of thickness and composition of a multilayer structure are presented.