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General analysis of electrodes in integrated-optics electrooptic devices

机译:集成光学电光器件中电极的一般分析

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Integrated-optics electrooptic devices that rely on the electrooptic effect obtained by applying electric waves on the electrodes deposited on the light waveguides are considered. A general structure for the devices is presented, and a computational method for calculating the electric-field distribution in the structure is described. Comparisons between numerical and exact results are made in cases with a known solution. The effect of the thickness of the electrodes is investigated. The characteristic impedance and effective dielectric constant are presented as a function of the electrode thickness for various width-gap ratios of the electrode structure. Calculations show that the electric field in the substrate is slightly influenced by the electrode thickness, whereas the characteristic impedance and effective dielectric constant are decreased as the electrode thickness is increased.
机译:考虑了依赖于通过在沉积在光波导上的电极上施加电波而获得的电光效应的集成光学电光器件。给出了设备的一般结构,并描述了用于计算结构中电场分布的计算方法。在已知解决方案的情况下,将数值结果与精确结果进行比较。研究了电极厚度的影响。对于电极结构的各种宽度-间隙比,特性阻抗和有效介电常数表示为电极厚度的函数。计算表明,基板中的电场受电极厚度的影响很小,而特性阻抗和有效介电常数随电极厚度的增加而降低。

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