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机译:真空等离子体喷涂沉积的钨和碳化硼涂层上的AD吸附
Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences 1295 Dingxi Road, Shanghai 200050, China;
Hydrogen Isotope Research Center, University of Toyama, Gofuku 3190, Toyama 930-8555, Japan;
Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences 1295 Dingxi Road, Shanghai 200050, China;
Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences 1295 Dingxi Road, Shanghai 200050, China;
Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences 1295 Dingxi Road, Shanghai 200050, China;
Key Laboratory of Inorganic Coating Materials, Shanghai Institute of Ceramics, Chinese Academy of Sciences 1295 Dingxi Road, Shanghai 200050, China;
tungsten coating; boron carbide coating; plasma spraying;
机译:用真空等离子喷涂方法在碳/碳复合材料上沉积碳化f保护层
机译:碳/碳复合材料上的碳化铪保护层涂层沉积着真空等离子体喷涂方法
机译:微观结构和性能对真空等离子喷涂工艺制备碳化硼涂层参数优化的影响
机译:HVOF喷涂沉积碳化物特性对碳化钨涂层结构和性能的影响
机译:等离子喷涂碳化钨-钴涂层的冶金学表征
机译:利用悬浮等离子喷涂沉积耐磨碳化物涂层
机译:通过从特殊改性的细粒粉末喷涂沉积的碳化物 - 金属系统(CR3C2-NICR和WC-CO-CR)涂层
机译:等离子喷涂碳化钨涂层的优化和再现性