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Real-time impedance matching system for ICRF heating in LHD

机译:用于LHD中ICRF加热的实时阻抗匹配系统

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In the Large Helical Device (LHD), long-pulse plasma experiments have been conducted using an ion cyclotron range of frequencies (ICRFs) heating system. Real-time impedance matching is necessary to keep injecting ICRF heating power into the plasma against the variation of the antenna impedance that changes gradually during a long-pulse plasma discharge. A feedback control system for the real-time impedance matching was constructed and utilized for long-pulse plasma discharges. As a component of the impedance matching device, liquid stub tuners were used. The reflected power ratio was reduced and kept sufficiently low by controlling the liquid heights during long-pulse plasma discharges, and the problem of the gradual increase in the reflected power was solved.
机译:在大型螺旋装置(LHD)中,已经使用离子回旋频率范围(ICRF)加热系统进行了长脉冲等离子体实验。必须进行实时阻抗匹配,才能将ICRF加热功率不断注入到等离子体中,以抵抗在长脉冲等离子体放电期间逐渐变化的天线阻抗变化。构建了用于实时阻抗匹配的反馈控制系统,并将其用于长脉冲等离子体放电。作为阻抗匹配装置的组成部分,使用了液体短截线调谐器。通过控制长脉冲等离子体放电期间的液体高度,减小了反射功率比并将其保持在足够低的水平,并且解决了反射功率逐渐增加的问题。

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