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Radiation damage of tungsten surface irradiated with high-energy hydrogen and helium beams of plasma focus device

机译:用高能氢气和等离子体聚焦装置照射钨表面的辐射损伤

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Tungsten (W) surface damages due to high-energy irradiations of a plasma focus device, including pure Hydrogen (H) ions, pure Helium (He) ions, and 50-50 H +He mixture was assessed. W is one of the candidate materials for use in the first-wall of nuclear fusion reactors such as tokamaks. Scanning electron microscopy (SEM), atomic force microscopy (AFM), and X-ray diffraction (XRD) were utilized to analyze these damages. SEM images, in a good agreement with blister formation mechanisms proposed by large-scale atomic/molecular massively parallel simulator (LAMMPS) simulations, illustrated three different states. Due to the ability of He ions to increase the join probability of tiny blisters, the intermediate state of H+He mixture irradiation, including large individual blisters perches between two limit states of pure H and pure He irradiations, including tiny individual blisters and large clusters of blisters, respectively. AFM analyses confirm the role of He to provide the intermediate state based on values of roughness in these three states. XRD analyses show the considerable changes in the position and intensity of peaks. The shifted peak positions toward the higher angles present a mean value in the intermediate state of H+He mixture irradiation. Also, the medium peak intensity of the intermediate state clarifies the role of He in modulating the sharp behavior of H in the irradiation of W sample. The calculated compressive stresses show a moderate value for the irradiation with the H+He mixture.
机译:评估钨(W)表面损坏由于等离子体聚焦装置的高能量照射,包括纯氢(H)离子,纯氦(HE)离子和50-50h + HE混合物。 W是用于在核聚变反应堆的第一墙中使用的候选材料之一,例如Tokamaks。扫描电子显微镜(SEM),原子力显微镜(AFM)和X射线衍射(XRD)分析这些损害。 SEM图像与大规模原子/分子大规模平行模拟器(LAMMPS)模拟提出的泡罩形成机制良好的图像,所示是三种不同状态。由于他离子的能力增加了微小水疱的连接概率,H + HE的中间状态辐照,包括大的单独水疱在纯H和纯粹的HE辐射的两个极限状态之间栖息,包括微小的单独水疱和大簇水泡分别。 AFM分析确认他基于这三种州的粗糙度的值来提供中间状态。 XRD分析显示了峰值位置和强度的相当大变化。朝向较高角度的移位峰位置存在于H + HE混合辐射的中间状态下的平均值。而且,中间状态的中峰强度阐明了他在调节H在W样品照射中的急剧行为的作用。计算的压缩应力显示出与H + Her混合物照射的适度值。

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