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Operation and shutdown dose rate analysis of CFETR ECRH system

机译:CFETR ECRH系统的操作和关机剂量分析

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摘要

Electron Cyclotron Resonance Heating (ECRH) is one of auxiliary heating systems to be installed in CFETR. For heating purpose of ECRH, a penetration space has been designed to transmit the wave to plasma. This will significantly increase the neutrons streaming through the wave channel and result in heavy irradiation of ECRH port structures. For nuclear safety analysis, the irradiation dose during operation of CFETR should be limited according to the regulation of radiological zone. In case of failure, the ECRH is planned to be maintained by workers after shutdown and waiting time of one month until the dose rate decreases to low level of 100 mu Sv/h. The shielding capabilities of ECRH port has been evaluated in view of dose effect both during operation and after shutdown of CFETR. For that purpose, a 3-D neutronics model has been built to launch the nuclear analysis. The operation dose rate was directly transferred from the neutron and photon flux by using of ICRP-74 flux to dose conversion factors. The shutdown dose rate was obtained with NASCA code system by coupling the Monte Carlo particle transport and FISPACT activation calculation. The obtained operation and shutdown dose data can be provided for the shielding optimization of ECRH wave system.
机译:电子回旋谐振加热(ECRH)是待安装在CFet中的辅助加热系统之一。为ECRH的加热用途,设计穿透空间以将波浪传递到等离子体。这将显着地增加中子流过波通道的流,并导致ECRH端口结构的重质照射。对于核安全性分析,根据放射区的调节,应限制CFetr的辐射剂量。在失败的情况下,计划在关闭和等待时间后的工人保持ECRH,直到剂量率降低到100μmSV/ h的低水平。 ECRH端口的屏蔽能力已根据操作期间和关闭CFetR后的剂量效应进行评估。为此目的,已经建立了一个3-D节能模型来推出核分析。通过使用ICRP-74助焊剂与剂量转化因子直接从中子和光子通量直接转移操作剂量速率。通过耦合蒙特卡罗颗粒传输和FISPACT活化计算,通过NASCA码系统获得关闭剂量率。可以提供所获得的操作和关闭剂量数据以用于ECRH波系统的屏蔽优化。

著录项

  • 来源
    《Fusion Engineering and Design》 |2020年第10期|111751.1-111751.6|共6页
  • 作者单位

    Shenzhen Univ Adv Energy Res Ctr Shenzhen 518060 Peoples R China|Shenzhen Univ Coll Optoelect Engn Minist Educ & Guangdong Prov Key Lab Optoelect Devices & Syst Shenzhen 518060 Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China|Univ Sci & Technol China Sch Phys Sci Hefei 230026 Anhui Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China|Univ Sci & Technol China Sch Phys Sci Hefei 230026 Anhui Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China|Univ Sci & Technol China Sch Phys Sci Hefei 230026 Anhui Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China;

    Chinese Acad Sci Inst Plasma Phys Hefei 230031 Anhui Peoples R China;

    Shenzhen Univ Adv Energy Res Ctr Shenzhen 518060 Peoples R China;

    Shenzhen Univ Coll Optoelect Engn Minist Educ & Guangdong Prov Key Lab Optoelect Devices & Syst Shenzhen 518060 Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    CFETR; ECRH; Operation dose; Shutdown dose; NASCA;

    机译:cfetr;Ecrh;操作剂量;关机剂量;纳斯卡;

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