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The effect of O_2 impurity on surface morphology of polycrystalline W during low-energy and high-flux He~+ irradiation

机译:O_2杂质对低能高通量He〜+辐射过程中多晶W表面形貌的影响

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The interaction between the impurities (such as carbon, nitrogen, oxygen) and the plasma-facing materials (PFMs) can profoundly influence the performance and service of the PFMs. In this paper, we investigated the influence of oxygen (O-2) impurity in the helium radio frequency (RF) plasma on the surface morphology of polycrystalline tungsten (W) irradiated at the surface temperature of 1450 +/- 50 K and the ion energy of 100 eV. The pressure ratio of O-2 to He (R) in RF source varied from 4.0 x 10(-6) to 9.0 x 10(-2). The total irradiation flux and fluence were (similar to)1.2 x 10(22) ions.m(-2).s(-1) and (similar to)1.0 x 10(26) ions.m(-2), respectively. After He+ irradiation, the specimen surface morphology was observed by scanning electron microscopy. It was found that with increasing R from 4.0 x 10(-6) to 9.0 x 10(-2) the thickness of nano-fuzz layer at the W surface was thinner and thinner, accompanied by the formation of rod-like structures. The erosion yield increased from 5.2 x 10(-4) to 2.3 x 10(-2) W/ion when R varied from 4.0 x 10(-6) to 9.0 x 10(-2) . The X-ray diffraction analysis shows that tungsten oxides were formed at the near surface of specimens when R exceeded 1.8 x 10(-2) . The erosion yield measurements revealed that in addition to surface physical sputtering process, the chemical erosion process could occur due to the interaction between oxygen-containing species and W at the surface. The results indicated that the presence of O-2 impurity in He plasma can obviously affect the surface microstructure of W. The study suggested that O-2 impurity can effectively reduce the growth of nano-fuzz structures.
机译:杂质(例如碳,氮,氧)与面对等离子体的材料(PFM)之间的相互作用会深刻影响PFM的性能和服务。本文研究了氦射频(RF)等离子体中的氧(O-2)杂质对在1450 +/- 50 K表面温度下辐照的多晶钨(W)的表面形态和离子的影响能量为100 eV。射频源中O-2与He(R)的压力比从4.0 x 10(-6)到9.0 x 10(-2)不等。总辐照通量和注量分别为(类似于)1.2 x 10(22)离子.m(-2).s(-1)和(类似于)1.0 x 10(26)离子.m(-2) 。 He +照射后,通过扫描电子显微镜观察样品的表面形态。发现随着R从4.0×10(-6)增加到9.0×10(-2),W表面的纳米绒毛层的厚度越来越薄,并伴随着杆状结构的形成。当R从4.0 x 10(-6)变化到9.0 x 10(-2)时,腐蚀产量从5.2 x 10(-4)增加到2.3 x 10(-2)W / ion。 X射线衍射分析表明,当R超过1.8×10(-2)时,在试样的近表面形成氧化钨。腐蚀产量的测量表明,除了表面物理溅射工艺外,由于含氧物质与表面W的相互作用,还可能发生化学腐蚀工艺。结果表明,He等离子体中O-2杂质的存在可以明显影响W的表面微观结构。研究表明O-2杂质可以有效地减少纳米绒毛结构的生长。

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