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Investigation of the growth mechanism, structure, and thermoelectric properties of thin PbTe films grown on mica

机译:在云母上生长的PbTe薄膜的生长机理,结构和热电性能的研究

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摘要

The growth mechanisms, structure and thermoelectric properties of thin PbTe films prepared by thermal evaporation in vacuum and subsequent deposition on mica substrates at temperatures T_s = 375, 525 and 635 K were studied. The films were prepared from charge with different electron concentrations (n ≈ 10~(17) and n ≈ 10~(20) cm~(-3)). The film thickness was varied in the range d = 4-500 nm. Electron microscopy study showed that PbTe grows on mica epitaxially in an island like fashion predominantly in the (111) orientation. It is established that in PbTe films there exists a critical thickness at which the transition from electron to hole conductivity with decreasing d is observed. Covering films with a protective layer, lowering the substrate temperature and increasing electron concentration in the charge result in narrowing of the thickness range corresponding to hole conductivity. It is shown that electron concentrations n in the charge and in thick PbTe films grown at the substrate temperature T_s = 525 K differ, the character and magnitude of this difference depending on n in the charge.
机译:研究了通过在真空下热蒸发并随后在T_s = 375、525和635 K的温度下沉积在云母衬底上制备的PbTe薄膜的生长机理,结构和热电性能。由具有不同电子浓度(n≈10〜(17)和n≈10〜(20)cm〜(-3))的电荷制备薄膜。膜厚度在d = 4-500nm的范围内变化。电子显微镜研究表明,PbTe外延在云母上以岛状生长,主要以(111)方向生长。可以确定的是,在PbTe膜中存在一个临界厚度,在该临界厚度下,随着d的减小,可以观察到从电子到空穴电导率的过渡。用保护层覆盖膜,降低衬底温度并增加电荷中的电子浓度会导致对应于空穴电导率的厚度范围变窄。结果表明,电荷和衬底温度T_s = 525 K时生长的厚PbTe薄膜中的电子浓度n不同,这种差异的特征和大小取决于电荷中的n。

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