Modeling photocatalytic destruction of the organic contaminants in continuous stir flow reactor

摘要

Thin-film technique is becoming an industry standard for the preparation of TiO_2-based photocatalyst for organic destruction. The catalyst provides several advantages over the conventional powder TiO_2 in the treatment of wastewater and groundwater. In this study, a continuous stir flow reactor model is developed capable of describing the photocatalytic process. The model incorporates the following fundamental mechanisms: adsorption, diffusion, liquid-film transfer, UV attenuation, and photocatalytic reaction. All of the simulation results indicate that there exists a highly nonlinear relation between each of these parameters and the destruction rate. Various incident light intensities also are incorporated to simulate the energy efficiency. The simulations illustrate that the photocatalytic model can be used to elucidate the effect of process variables. It is also possible to custom-design a catalyst for the treatment of a particular waste stream.