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Chemical exfoliation synthesis of boron nitride and molybdenum disulfide 2D sheets via modified Hummers' method

机译:通过改性悍马法的氮化硼和钼二硫化钼2D片的化学剥离合成

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摘要

To realize long-cherished dreams of employing inorganic graphene cousins such as boron nitride (BN) and molybdenum disulfide (MoS_2) for large area coating applications, e.g., miniaturized electronic chips, radio wave devices, energy storage, LEDs, and solar cells, scalable synthesis pathways are presently being hunted with unprecedented curiosity to obtain large-scale 2D exfoliated sheets. Modified Hummers' method provides an apt alternate and has already been established for graphene. However, it currently faces limitations in scalable production of BN and MoS_2 as the nature of binding in their crystallographic lattice as well as their interactions with the solvents are different in these materials' vis-a-vis graphene. Therefore, intensely focused efforts are needed to optimize synthesis parameters to produce scalable quantities of these advanced materials at an economical cost. By hybridizing BN with MoS_2, for example, one can maneuver the material's dielectric functionality, such as frequency bandwidth where it functions. In this report, we present a facile synthesis of BN and MoS_2 via modified Hummers' synthesis. While the fixed BN:KMnO_4 precursor ratio of 1:6 was considered to obtain 2D BN, it (MoS_2:KMnO_4) was altered, i.e., 1:6, 1:5, and 1:4, for obtaining MoS_2 sheets. Interestingly, while precursor ratio 1:6 resulted in average lateral dimension ~100 nm, precursor ratio of 1:4 yielded lateral dimensions ~500 nm as evidenced from TEM measurements. Solvothermal (200 °C for 2 h) reduction was carried out for both BN and MoS_2 to remove the surface functionalities employing reducing solvent DMF. We obtained few-layer crystalline atomic sheets of BN and MoS_2. While inter-atomic distance in 2D BN was measured to be ~1.5 A° as evident from HRTEM imaging, E_(2g) vibration mode ~ 1360 cm~(-1) was recorded in Raman spectroscopy. While HRTEM imaging reveals that average interatomic (Mo-S) distances in MoS_2 atomic sheets was obtained to be ~2.41 A°, two distinct MoS_2 Raman modes, viz., E_(2g) ~404 cm~(-1) and A_(1g) ~385 cm~(-1), were witnessed. Microwave blending of 2D MoS_2 with 2D BN resulted in significant modulation of dielectric behavior. While the modified Hummers' synthesis for BN and MoS_2 will be a boon in disguise for several dream applications envisaged earlier, it may inspire future generations of devices and sensors with novel functionalities, it is believed.
机译:实现在大面积涂层应用中使用无机石墨烯表兄弟如氮化硼(BN)和二硫化钼(MOS_2)的长期梦想,例如小型电子芯片,无线电波器件,能量存储,LED和太阳能电池,可扩展目前,合成途径以前所未有的好奇心被捕以获得大规模的2D剥离片。修改后的悍马的方法提供了APT交替,已经为石墨烯建立。然而,它目前面临BN和MOS_2可扩展生产中的限制,因为在它们的晶格中结合的性质以及它们与溶剂的相互作用在这些材料的Vis-A-Vis Graphene中是不同的。因此,需要强烈的重点努力来优化合成参数以经济成本生产这些先进材料的可扩展量。例如,通过用MOS_2杂交BN,可以操纵材料的介电功能,例如其功能的频率带宽。在本报告中,我们通过修改的悍马合成呈现BN和MOS_2的容易合成。当固定的BN:KMnO_4前体比例为1:6时被认为获得2D BN,而是改变(MOS_2:KMNO_4),即1:6,1:5和1:4,用于获得MOS_2片。有趣的是,虽然前体比例1:6导致平均横向尺寸〜100nm,前体比为1:4产生横向尺寸〜500nm,从TEM测量中证明。对于BN和MOS_2进行溶剂热(200℃,2小时)还原,以除去采用还原溶剂DMF的表面官能团。我们获得了Bn和MOS_2的几层晶体晶片。虽然测量了2D BN中的原子间距离为〜1.5 A°,但从HRTEM成像中明显,E_(2G)振动模式〜1360cm〜(-1)被记录在拉曼光谱中。而HRTEM成像显示,获得MOS_2原子片中的平均交叉组(MO-S)距离为〜2.41 A°,两个不同的MOS_2拉曼模式,e_(2g)〜404cm〜(-1)和a_( 1G)〜385cm〜(-1),得到了见证。具有2D BN的2D MOS_2的微波混合导致介质行为的显着调制。虽然改进的悍马的BN和MOS_2的合成将是一个伪装的伪装,但是对于早些时候设想的几种梦想应用,它可能会激发未来几代设备和传感器,具有新颖的功能,据信。

著录项

  • 来源
    《Emergent Materials》 |2021年第3期|645-654|共10页
  • 作者单位

    Department of Physics Indian Institute of Technology Patna Bihta Bihar 801103 India;

    Department of Physics Indian Institute of Technology Patna Bihta Bihar 801103 India Department of Physics United Arab Emirates University Al-Ain UAE;

    Department of Physics Indian Institute of Technology Patna Bihta Bihar 801103 India Birck Nanotechnology Centre Purdue University West Lafayette Indiana 47907 USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    2D material; Boron nitride; Molybdenum disulfide; Chemical exfoliation; Dielectric;

    机译:2D材料;氮化硼;二硫化钼;化学剥离;介电;

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