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首页> 外文期刊>Electronics Letters >Design and fabrication of ultra-small overlapped AWG demultiplexer based on /spl alpha/-Si nanowire waveguides
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Design and fabrication of ultra-small overlapped AWG demultiplexer based on /spl alpha/-Si nanowire waveguides

机译:基于/ spl alpha / -Si纳米线波导的超小型重叠AWG多路分解器的设计与制造

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摘要

A novel layout for an ultra-compact arrayed-waveguide grating (AWG) demultiplexer is presented. The present layout has two overlapped free propagation regions, and is more compact than a conventional layout. Using /spl alpha/Si-on-SiO/sub 2/ nanowire waveguides, an ultra-small 4/spl times/4 AWG (about 40/spl times/50 /spl mu/m/sup 2/) with channel spacing of 11 nm is fabricated and characterised.
机译:提出了一种用于超紧凑阵列波导光栅(AWG)多路分解器的新颖布局。本布局具有两个重叠的自由传播区域,并且比常规布局更紧凑。使用/ spl alpha / Si-on-SiO / sub 2 /纳米线波导,超小4 / spl倍/ 4 AWG(约40 / spl倍/ 50 / spl mu / m / sup 2 /),通道间距为制造并表征了11 nm。

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