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首页> 外文期刊>Electron Devices, IEEE Transactions on >A Simple Semiempirical Short-Channel MOSFET Current–Voltage Model Continuous Across All Regions of Operation and Employing Only Physical Parameters
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A Simple Semiempirical Short-Channel MOSFET Current–Voltage Model Continuous Across All Regions of Operation and Employing Only Physical Parameters

机译:一个简单的半经验短沟道MOSFET电流-电压模型,在所有工作区域均连续,仅使用物理参数

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摘要

A simple semiempirical model ID(VGS, VDS) for short-channel MOSFETs applicable in all regions of device operation is presented. The model is based on the so-called ldquotop-of-the-barrier-transportrdquo model, and we refer to it as the ldquovirtual sourcerdquo (VS) model. The simplicity of the model comes from the fact that only ten parameters are used. Of these parameters, six are directly obtainable from standard device measurements: 1) gate capacitance in strong inversion conditions (typically at maximum voltage VGS = Vdd); 2) subthreshold swing; 3) drain-induced barrier lowering (DIBL) coefficient; 4) current in weak inversion (typically Ioff at VGS = 0 V) and at high VDS; 5) total resistance at VDS = 0 V and VGS = Vdd and 6), effective channel length. Three fitted physical parameters are as follows: 1) carrier low-field effective mobility; 2) parasitic source/drain resistance, 3) the saturation region carrier velocity at the so-called virtual source. Lastly, a constrained saturation-transition-region empirical parameter is also fitted. The modeled current versus voltage characteristics and their derivatives are continuous from weak to strong inversion and from the linear to saturation regimes of operation. Remarkable agreement with published state-of-the-art planar short-channel strained devices is demonstrated using physically meaningful values of the fitted physical parameters. Moreover, the model allows for good physical insight in device performance properties, such as extraction of the VSV, which is a parameter of critical technological importance that allows for continued MOSFET performance scaling. The simplicity of the model and the fact that it only uses physically meaningful parameters provides an easy way for technology benchmarking and performance projection.
机译:提出了适用于器件工作所有区域的短通道MOSFET的简单半经验模型ID(VGS,VDS)。该模型基于所谓的“障碍运输”模型,我们将其称为“虚拟源”(VS)模型。该模型的简单性来自仅使用十个参数的事实。在这些参数中,有六个可以直接从标准器件测量中获得:1)在强反型条件下(通常在最大电压VGS = Vdd时)的栅极电容; 2)阈下摆动; 3)漏极引起的势垒降低(DIBL)系数; 4)弱反相时的电流(通常在VGS = 0 V时为Ioff)和高VDS时的电流; 5)VDS = 0 V且VGS = Vdd时的总电阻,6)有效通道长度。拟合的三个物理参数如下:1)载波低场有效迁移率; 2)寄生源极/漏极电阻,3)所谓虚拟源极的饱和区载流子速度。最后,还拟合了约束饱和过渡区域的经验参数。建模的电流与电压特性及其导数从弱到强以及从线性到饱和工作状态都是连续的。使用已拟合的物理参数的有意义的物理值,可以证明与已发布的最新技术的平面短通道应变设备具有显着的一致性。此外,该模型可以很好地了解器件性能属性,例如提取VSV,这是至关重要的技术重要性参数,可实现MOSFET性能的持续扩展。该模型的简单性及其仅使用物理上有意义的参数的事实为技术基准测试和性能预测提供了简便的方法。

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