...
首页> 外文期刊>Electron Devices, IEEE Transactions on >Ultralow Power Resistance Random Access Memory Device and Oxygen Accumulation Mechanism in an Indium–Tin-Oxide Electrode
【24h】

Ultralow Power Resistance Random Access Memory Device and Oxygen Accumulation Mechanism in an Indium–Tin-Oxide Electrode

机译:铟锡氧化物电极中的超低功率电阻随机存取存储装置和氧积累机理

获取原文
获取原文并翻译 | 示例
           

摘要

This paper proposes low power consumption resistance random access memory (RRAM) devices with indium–tin-oxide (ITO) electrodes. The development of the Internet of Things (IoT) is a trend in future technology, but the bottleneck in IoT development is high power consumption; therefore, targeting low-power-consumption memory is crucial for the IoT. ITO-capped RRAM devices have been shown to exhibit outstanding performance and low power consumption, and here, we propose an oxygen accumulation mechanism by analyzing device characteristics. We find that the conduction current mechanism will be affected by oxygen absorbance in the ITO electrode. During the forming and set processes, oxygen ions will be propelled into the ITO electrode due to its oxygen vacancy-rich property; therefore, we find Schottky emission both at high-resistance state and low-resistance state and that the device exhibits an automatic current compliance property. Varied stop-voltage measurements were carried out to verify the device mechanism. Because of its capability for oxygen storage, the thick ITO layer was confirmed to affect the characteristic due to a difference in oxygen gradient. A new structure and novel material are proposed, based on the devices with ITO electrodes to improve performance and reduce power consumption.
机译:本文提出了一种具有铟锡氧化物(ITO)电极的低功耗电阻随机存取存储器(RRAM)器件。物联网(IoT)的发展是未来技术的趋势,但是IoT发展的瓶颈是高功耗。因此,针对低功耗存储器的定位对于物联网至关重要。 ITO封盖的RRAM器件已显示出出色的性能和低功耗,在这里,我们通过分析器件特性提出了一种氧气积累机制。我们发现,传导电流机制将受到ITO电极中氧吸收的影响。在成型和凝固过程中,由于其氧空位丰富的特性,氧离子将被推进到ITO电极中。因此,我们发现高阻态和低阻态均出现肖特基发射,并且该器件表现出自动电流顺应性。进行了各种停止电压测量以验证器件机制。由于其具有储氧能力,因此可以确认厚的ITO层会由于氧梯度的差异而影响特性。基于具有ITO电极的器件,提出了一种新的结构和新颖的材料,以提高性能并降低功耗。

著录项

  • 来源
    《Electron Devices, IEEE Transactions on》 |2016年第12期|4737-4743|共7页
  • 作者单位

    Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Department of Physics, National Sun Yat-sen University, Kaohsiung, Taiwan;

    Institute of Microelectronics, Tsinghua University, Beijing, China;

    Institute of Microelectronics, Tsinghua University, Beijing, China;

    Institute of Microelectronics, Tsinghua University, Beijing, China;

    Department of Electronics Engineering, National Chiao Tung University, Hsinchu, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Indium tin oxide; Electrodes; Random access memory; Resistance; Power demand;

    机译:氧化铟锡;电极;随机存取存储器;电阻;功率需求;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号