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首页> 外文期刊>Electron Devices, IEEE Transactions on >Using Single-Layer HfS2as Prospective Sensing Device Toward Typical Partial Discharge Gas in SF6-Based Gas-Insulated Switchgear
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Using Single-Layer HfS2as Prospective Sensing Device Toward Typical Partial Discharge Gas in SF6-Based Gas-Insulated Switchgear

机译:使用单层HfS 2 作为对基于SF 6 的气体绝缘开关设备中典型局部放电气体的传感设备

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摘要

We performed density functional theory study on the adsorption properties of five typical SF6decomposition products in gas-insulated switchgear on single-layer HfS2. The adsorption structure, adsorption energy, and electron transfer were discussed. We also considered the physical and chemical interactions between the adsorbed gas molecule and the HfS2monolayer with the discussion of the charge density difference configurations, the electron localization functional configurations, and the density of states (DOSs). To assess the sensing property of single-layer HfS2-based gas sensor, we built a simulated device with three parts, including left lead, scattering region, and right lead and the response to different gas molecules was evaluated. The results indicated that the SO2F2molecule exhibited the largest adsorption energy but the HF molecule had the largest electron transfer. Only H2S adsorption leads to the obvious decrease of the bandgap. All the gas molecules could have chemical interactions with the HfS2monolayer with different degrees based on the DOS analysis. For the simulated sensing device, according to the nonequilibrium Green’s function method, it showed better response and selectivity in the voltage range between 1.2 and 1.6 V. The device exhibited the maximum current after HF adsorption and the minimum current after SO2F2adsorption.
机译:我们对五个典型的SF n 6在单层HfS上的气体绝缘开关设备中分解产物 n 2 n。讨论了吸附结构,吸附能和电子转移。我们还考虑了吸附气体分子与HfS n 2 n单层,其中讨论了电荷密度差配置,电子定位功能配置和状态密度(DOS)。评估单层HfS n 2 n的气体传感器,我们构建了一个包含三个部分的模拟设备,包括左铅,散射区和右铅,并评估了对不同气体分子的响应。结果表明SO n 2 nF n 2 n分子显示出最大的吸附能,而HF分子具有最大的电子转移。仅H n 2 nS吸附导致带隙明显减小。所有的气体分子都可以与HfS n 2单层,基于DOS分析。对于模拟感测设备,根据非平衡格林函数方法,它在1.2至1.6 V的电压范围内表现出更好的响应和选择性。该设备在HF吸附后表现出最大电流,在SO n 2 nF n 2 nadsorption。

著录项

  • 来源
    《Electron Devices, IEEE Transactions on》 |2019年第1期|689-695|共7页
  • 作者单位

    School of Electrical Engineering and Automation, Wuhan University, Wuhan, China;

    School of Electrical Engineering and Automation, Wuhan University, Wuhan, China;

    School of Electrical Engineering and Automation, Wuhan University, Wuhan, China;

    School of Electrical Engineering and Automation, Wuhan University, Wuhan, China;

    School of Electrical Engineering and Automation, Wuhan University, Wuhan, China;

    State Grid Chongqing Electric Power Company, Chongqing, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Adsorption; Hafnium; Photonic band gap; Sulfur hexafluoride; Gas detectors;

    机译:吸附;H;光子带隙;六氟化硫;气体检测仪;

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