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Lithography simulator helps designers check integrity of OPC layouts

机译:光刻模拟器可帮助设计人员检查OPC布局的完整性

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摘要

Photolithography-tool-vendor Sigma-C con-tends that your OPC (optical-proximity-corrected) design may not be correct at all. The Munich-based vendor has expanded into the design-for-manufacturing tool market with the new Solid+ microlithogra-phy simulator that lets IC designers know whether photoresist equipment can accurately print their OPC-IC layouts. Sigma-C based the new tool on its Solid line of lithography-optimization tools. Those tools draw on a database that characterizes equipment, materials, and processes and helps lithography engineers simulate and derive manufacturing processes.
机译:光刻工具供应商Sigma-C认为,您的OPC(光学接近度校正)设计可能根本不正确。总部位于慕尼黑的供应商已通过新的Solid +微光刻技术模拟器扩展了制造设计工具市场,该模拟器可使IC设计人员知道光刻胶设备是否可以准确地打印其OPC-IC布局。 Sigma-C将新工具基于其固态光刻优化工具系列。这些工具利用可表征设备,材料和工艺的数据库,并帮助光刻工程师模拟和推导制造工艺。

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