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Irregular Electrodeposition of Cu-Sn Alloy Coatings in [EMIM]Cl Outside the Glove Box with Large Layer Thickness

机译:在具有大层厚度的手套箱外的Cu-Sn合金涂层的不规则电沉积

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Thick Cu?Sn alloy layers were produced in an [EMIM]Cl ionic-liquid solution from CuCl2 and SnCl2 in different ratios. All work, including the electrodeposition, took place outside the glovebox with a continuous argon stream over the electrolyte at 95 °C. The layer composition and layer thickness can be adjusted by the variation of the metal-salts content in the electrolyte. A layer with a thickness of up to 15 μm and a copper content of up to ωCu = 0.86 was obtained. The phase composition was characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray fluorescence (XRF). Furthermore, it was found that the relationship between the alloy composition and the concentration of the ions in the electrolyte is described as an irregular alloy system as according to Brenner. Brenner described such systems only for aqueous electrolytes containing complexing agents such as cyanide. In this work, it was confirmed that irregular alloy depositions also occur in [EMIM]Cl.
机译:在不同比例的CuCl2和SnCl2中在[emim] Cl离子 - 液体溶液中产生浓稠的Cu 2合金层。包括电沉积在内的所有工作,在手套箱外部发生在95℃的电解质上,连续氩气流。层组合物和层厚度可以通过电解质中的金属盐含量的变化来调节。获得厚度高达15μm的层和高达ωcu= 0.86的铜含量。通过扫描电子显微镜(SEM),X射线衍射(XRD)和X射线荧光(XRF),表征相组合物。此外,发现合金组合物与电解质中离子浓度之间的关系被描述为根据Brenner的不规则合金系统。 Brenner仅描述了含有含氰化物如氰化物的含水电解质的这种系统。在这项工作中,证实了在[emim] Cl中也发生了不规则合金沉积。

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