Among many the oxynitrides, TiNO and AlCrNO, have diverse applications in different technological fields. We prepared TiNO/AlCrNO/Al thin films on aluminum substrates using the method of dc reactive magnetron sputtering. The reactive gas flow, gas mixture, and target potential were applied as the sputtering conditions during the deposition in order to control the chemical composition. The multi-layer films have been prepared in an Ar and O2+N2 gas mixture rate. The surface properties were estimated by performing scanning electron microscopy (SEM). At a wavelength range of 0.3~2.5 μm, the exact composition and optical properties of thin films were measured by Auger electron spectroscopy (AES) and Ultraviolet-visible-near infrared (UV-Vis-NIR) spectrophotometry. The optimal absorptance of multi-layer films was exhibited above 95.5% in the visible region of the electromagnetic spectrum, and the reflectance was achieved below 1.89%.
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机译：在许多氧氮化物中，TINO和ALCRNO在不同的技术领域具有不同的应用。我们使用DC反应磁控溅射的方法在铝基衬底上制备了TINO / ALCRNO / AL薄膜。在沉积期间施加反应气流，气体混合物和靶电位作为溅射条件，以控制化学组合物。已经在Ar和O 2 / + n + n 2 气体混合物中制备了多层膜。通过进行扫描电子显微镜（SEM）估计表面性质。在0.3〜2.5μm的波长范围内，通过螺旋钻电子光谱（AES）和紫外 - 可见近红外（UV-Vis-NIR）分光光度法测量薄膜的精确组成和光学性质。在电磁谱的可见区域中显示出多层膜的最佳吸收率在95.5％以上，反射率降至1.89％以下。
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