...
首页> 外文期刊>Procedia CIRP >Research on Process and Mechanism of Micro Punching driven by Laser-induced Cavitation
【24h】

Research on Process and Mechanism of Micro Punching driven by Laser-induced Cavitation

机译:激光诱导空化驱动的微冲压工艺与机理研究

获取原文
   

获取外文期刊封面封底 >>

       

摘要

In this paper, a method of micro-punching driven by combining laser-induced cavitation was proposed. By analysing the surface roughness and the morphology of copper foil punched by the process, the influences of key process parameters including laser energy, cavitation position and punching times on the punching workpiece were systematically studied. With the laser focus position changing from -1 mm to +3 mm, the maximum depth of punching copper foil pits gradually decreased from 118.10 μm to 55.19 μm, and the ablative degree of the pit bottom reduced gradually. Meanwhile, it is found by high speed camera that the plasma shock, collapse shock and micro-jet produced by laser induced cavitation are the main driven power sources for deformation. Finally, the process is optimized with laser focus position of +2 mm, laser energy of 10.1 mJ and 5 laser pulses, the surface ablation could be completely avoided.
机译:在本文中,提出了一种通过组合激光诱导的空化驱动的微冲压方法。通过分析该过程冲压的铜箔的表面粗糙度和形态,系统地研究了在冲压工件上的密钥工艺参数的影响,包括激光能量,空化位置和冲压时间。随着激光焦点位置从-1mm到+ 3 mm的变化,冲孔铜箔坑的最大深度从118.10μm逐渐降低到55.19μm,凹坑底部的烧蚀程度逐渐减小。同时,通过高速摄像头,通过激光诱导空化产生的等离子体冲击,塌陷和微喷射是用于变形的主要驱动电源。最后,通过+2mm的激光聚焦位置优化该过程,激光能量为10.1MJ和5激光脉冲,可以完全避免表面消融。

著录项

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号