Using the hydrodynamical model of semiconductor plasmas and considering the origin of plasmon-longitudinal optical phonon interaction in effective third-order optical susceptibility, an analytical investigation of modulational amplification is performed in magnetoactive n-type doped III–V semiconductors. Expressions for necessary threshold pump amplitude for the onset of modulational amplification and growth rate of modulated wave have been obtained. Numerical estimations have been made for n-InSb crystal at 77 K illuminated by a 10.6 ?m CO2 laser. The dependence of threshold pump amplitude and growth rate of modulated wave on wave number, externally applied magnetic field (via electron-cyclotron frequency) and doping concentration (via electron-plasma frequency) have been explored. It has been found that the threshold pump amplitude can be lowered whereas the growth rate of modulated wave can be enhanced by proper selection of externally applied magnetic field and doping concentration of semiconductor crystal. The results of the present analytical investigation strongly manifest the importance of magnetoactive heavily n-type doped III–V semiconductors as appropriate hosts for modulational instability processes.
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机译:利用半导体等离子体的流体动力学模型,考虑到具有有效三阶光学敏感性的等离子体纵向光学声子相互作用的起源,在磁性N型掺杂III-V半导体中进行调节扩增的分析研究。已经获得了用于调制波的必要阈值泵幅度的表达式,并且已经获得了调制波的生长速率。通过10.6μMCO2激光照射的77k,对N-INSB晶体进行数值估计。已经探讨了阈值泵幅度和调制波的生长速率在波数,外部施加的磁场(通过电子 - 回火频率)和掺杂浓度(通过电子等频率)上的依赖性。 It has been found that the threshold pump amplitude can be lowered whereas the growth rate of modulated wave can be enhanced by proper selection of externally applied magnetic field and doping concentration of semiconductor crystal.本分析研究的结果强烈表现出磁性重型N型掺杂III-V半导体作为适当宿主的模型稳定性过程的重要性。
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