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Synthesis of Bi2S3 thin films based on pulse-plating bismuth nanocrystallines and its photoelectrochemical properties

机译:基于脉冲镀铋纳米晶体及其光电色化学的Bi2S3薄膜合成

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The solubility of Bi 3 in aqueous solution is an important factor that limits the fabrication of high-quality Bi 2 S 3 thin films. In order to find a low-cost method to manufacture high-quality Bi 2 S 3 thin films, we are reporting the preparation of the Bi 2 S 3 thin films based on pulse-plating method in this paper for the first time. The nano-bismuth particles were obtained by electroplating on fluorine-doped SnO 2 (FTO)-coated conducting glass substrates with saturated bismuth potassium citrate solution as the electroplating bath, and then it was put into a muffle furnace to oxidize. Finally, the thin films depositing on FTO glass substrates were put into the thioacetamide solution for vulcanization. In the end, the Bi 2 S 3 thin films were successfully prepared on FTO glass substrates. Different characterization techniques were used to characterize the structure, morphology and photoelectrochemical properties of the prepared thin films. The test results revealed that we used this method to synthesize the high-quality Bi 2 S 3 thin films, thus the Bi 2 S 3 materials synthesized through this method are promising candidates in photoelectrochemical application.
机译:BI 3在水溶液中的溶解度是限制高质量BI 2 S 3薄膜的制造的重要因素。为了找到生产高质量的BI 2 S 3薄膜的低成本方法,我们首次在本文中基于脉冲镀方法的制备。通过在氟掺杂的SnO 2(FTO)涂覆的导电玻璃基板上用饱和铋钾溶液作为电镀浴,将纳米铋颗粒进行,然后将其放入Muffle炉中以氧化。最后,将在FTO玻璃基板上沉积的薄膜施加到硫化酰胺溶液中。最后,在FTO玻璃基板上成功地制备了BI 2 S 3薄膜。使用不同的表征技术来表征制备薄膜的结构,形态和光电化学性质。测试结果表明,我们利用该方法合成高质量的BI 2 S 3薄膜,因此通过该方法合成的Bi 2 S 3材料是光电化学应用中的候选者。

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