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首页> 外文期刊>International Journal of Electrochemical Science >Mechanism of Chromium Electrodeposition from Cr(III) Baths on Nickel and Chromium Electrode Surfaces
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Mechanism of Chromium Electrodeposition from Cr(III) Baths on Nickel and Chromium Electrode Surfaces

机译:镍和铬电极表面Cr(III)浴中铬电沉积机理

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The electrode state changes with the thickening of the coating in Cr(Ⅲ) thick chromium plating. Thedeposition of Cr(Ⅲ) is carried out on the substrate at the beginning of deposition and on the chromiumcoating when the chromium coating becomes thicker. The aim of this work is to study the influence ofthe change of electrode state on the reduction mechanism of trivalent chromium. The electrodepositionmechanism of Cr(Ⅲ) is studied by cyclic voltammetry, electrochemical impendance spectroscopy,chronoamperometry and polarization technique. The results show that the reduction of Cr(Ⅲ) onchromium coating electrode has a negative deposition potential, higher charge transfer resistance,higher activation energy, and lower diffusion coefficient than those on the nickel electrode, thereduction of Cr(Ⅲ) is more difficult on chromium coating electrode. The change of electrode state isone of the reasons for the difficulty in thickening of chromium coating.
机译:电极状态随着Cr(Ⅲ)厚铬镀层中的涂层的增厚而变化。 Cr(Ⅲ)的沉积在沉积开始时在基板上进行,并且当铬涂层变厚时在铬涂上。这项工作的目的是研究电极状态变化对三价铬的还原机理的影响。 CR(Ⅲ)的电沉积机制通过循环伏安法,电化学迫存光谱,计时率和偏振技术研究。结果表明,Cr(Ⅲ)的卷发电极的减少具有负沉积电位,较高的电荷转移电阻,较高的激活能量和低于镍电极上的扩散系数,Cr(Ⅲ)的介乎更加困难铬涂布电极。电极状态的变化是铬涂层增厚难度的原因。

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