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首页> 外文期刊>Advanced Science >Atomic Origin of Interface‐Dependent Oxygen Migration by Electrochemical Gating at the LaAlO3–SrTiO3 Heterointerface
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Atomic Origin of Interface‐Dependent Oxygen Migration by Electrochemical Gating at the LaAlO3–SrTiO3 Heterointerface

机译:Laalo3-SRTIO3异偶表面上的电化学浇注的界面依赖性氧气迁移的原子来源

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Electrical control of material properties based on ionic liquids (IL) has seen great development and emerging applications in the field of functional oxides, mainly understood by the electrostatic and electrochemical gating mechanisms. Compared to the fast, flexible, and reproducible electrostatic gating, electrochemical gating is less controllable owing to the complex behaviors of ion migration. Here, the interface‐dependent oxygen migration by electrochemical gating is resolved at the atomic scale in the LaAlO3–SrTiO3 system through ex situ IL gating experiments and on‐site atomic‐resolution characterization. The difference between interface structures leads to the controllable electrochemical oxygen migration by filling oxygen vacancies. The findings not only provide an atomic‐scale insight into the origin of interface‐dependent electrochemical gating but also demonstrate an effective way of engineering interface structure to control the electrochemical gating.
机译:基于离子液体(IL)的材料性质的电气控制在功能氧化物领域中看到了良好的发展和新兴应用,主要由静电和电化学门控机构理解。与快速,柔韧,可再现的静电门控相比,由于离子迁移的复杂行为,电化学门控不太可控。这里,通过电化学门控的界面依赖性氧气迁移通过例如原位IL门控实验和现场原子分辨率表征在Laalo3-SRTIO3系统中的原子标度处分。界面结构之间的差异通过填充氧气空位而导致可控电化学氧迁移。该发现不仅为依赖于界面依赖电化学门控的原点提供原子尺度洞察,而且还展示了工程界面结构的有效方式来控制电化学门控。

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