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Electrochromic Properties of Li- Doped NiO Films Prepared by RF Magnetron Sputtering

机译:RF磁控溅射制备的Li-掺杂NiO膜的电致变色特性

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In this study: various amounts of Li2CO3 powders were mixed into NiO powders to fabricate the Li- added NiO (NiO:Li) targets. The electrochromic films of LiNiO were deposited on ITO glasses at room temperature (R.T.) by RF magnetron sputtering. The thicknesses of electrochromic LiNiO films were kept about 200 nm. The ECD device was constructed with structure of Glass/ITO/ LiNiO /Gel-electrolyte/ITO/Glass. The results indicated that the optimal electrochromic characteristics of Li0.16Ni0.58O thin films could be obtained by 10 wt% Li2CO3 added NiO target. The optimized characteristics of ECDs could be achieved with the intercalation charge (Q) of 11.93 mC/cm2, the optical density (ΔOD) of 0.38, the transmittance change (ΔT) of 44.1%, and the coloring efficiency (η) of 31.8 cm2/C at the wavelength of 550 nm by setting voltage of 3.2V. The results demonstrate that the doping of Li ions into NiO films can effectively enhance the characteristics of ECD devices. The reason may due to the increased amount of charge stored in the electrochromic devices (ECDs).
机译:在该研究中:将各种量的Li 2 CO 3粉末混合到NiO粉末中,以制造Li-添加的NiO(NiO:Li)靶标。通过RF磁控溅射在室温(R.T.)的ITO眼镜上沉积LINIO的电致变色薄膜。电致变色LINIO膜的厚度保持约200nm。通过玻璃/ ITO / LINIO /凝胶电解质/ ITO /玻璃的结构构造ECD装置。结果表明,Li0.16Ni0.58O薄膜的最佳电致变色特性可获得10wt%的Li 2 CO 3加入的NiO靶标。通过11.93mc / cm2的插入电荷(q),光学密度(ΔOd)为0.38,透射率变化(Δt)为44.1%,着色效率(η)为31.8cm2,可以实现ECD的优化特性,以及31.8 cm2的着色效率(η) / C通过设定3.2V的电压在550nm的波长下。结果表明,Li离子进入NiO膜的掺杂可以有效地增强ECD器件的特性。原因可能是由于储存在电致变色装置(ECD)中的电荷量增加。

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