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Fabrication of Zinc Oxide and Nanostructured Porous Silicon Composite Micropatterns on Silicon

机译:硅氧化锌和纳米结构多孔硅复合微图案的制造

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The luminescent properties of zinc oxide (ZnO) and nanostructured porous silicon (PSi) make these materials very appealing for photoemission applications. The current study reports on the fabrication of a composite of ZnO and nanostructured porous silicon micropatterns (ZnO PSi micropatterns) onto heavily-doped silicon surfaces. The proposed composite micropattern is devoted to the future development of light-emitting diodes. The fabrication of the ZnO PSi micropatterns was carried out in a two–step process. (1) A regular hexagonal micropattern of a photoresist/ZnO stack was fabricated by UV lithography on crystalline silicon substrates. (2) Before being lifted off the photoresist, nanostructured PSi micropatterns were fabricated by electrochemically etching the exposed areas of the silicon substrate. Subsequently, wet etching of the photoresist was carried out for the final development of the composite ZnO and PSi micropatterns. Further, thin films of ZnO and nanostructured PSi layers were characterized. In particular, their photoluminescent properties were analyzed, as well as their morphology and composition. The experimental PL results show that the ZnO layers have emission broadbands centered at (2.63 eV, blue), while the PSi layers show a band centered at (1.71 eV, red). Further, the emission peaks from the PSi layers can be tuned by changing their fabrication conditions. It was observed that the properties of the ZnO thin films are not influenced by either the surface morphology of PSi or by its PL emissions. Therefore, the PL properties of the composite ZnO PSi micropatterns are equivalent to those featuring the addition of PSi layers and ZnO thin films. Accordingly, broadband optical emissions are expected to arise from a combination between the ZnO layer (blue band) and PSi (red band). Furthermore, the electrical losses associated with the PSi areas can be greatly reduced since ZnO is in contact with the Si surface. As a result, the proposed composite micropatterns might be attractive for many solid-state lighting applications, such as light-emitting diodes.
机译:氧化锌(ZnO)和纳米结构多孔硅(PSI)的发光性能使得这些材料非常吸引光电应用。目前的研究报告了ZnO和纳米结构多孔硅片(ZnO PSI MicroOmoRn)的复合物在重掺杂的硅表面上的制造。所提出的复合微透镜致力于未来发光二极管的发展。在两步过程中进行ZnO PSI微图案的制造。 (1)通过UV光刻在晶体硅基衬底上制造光致抗蚀剂/ ZnO叠层的常规六边形微图案。 (2)在抬起光致抗蚀剂之前,通过电化学蚀刻硅衬底的暴露区域来制造纳米结构PSI微图案。随后,进行光致抗蚀剂的湿蚀刻,用于复合ZnO和PSI微图案的最终显影。此外,表征ZnO和纳米结构层的薄膜。特别地,分析了它们的光致发光性能,以及它们的形态和组合物。实验的PL结果表明,ZnO层具有以(2.63eV,蓝色)为中心的发射宽带,而PSI层显示在(1.71eV,红色)以(1.71eV)为中心的带。此外,可以通过改变其制造条件来调谐来自PSI层的发射峰值。观察到ZnO薄膜的性质不受PSI的表面形态或其PL排放的影响。因此,复合ZnO PSI Micropatterns的PL性能等同于具有PSI层和ZnO薄膜的添加的那些。因此,预期宽带光学发射从ZnO层(蓝频带)和PSI(红色频带)之间的组合产生。此外,由于ZnO与Si表面接触,因此可以大大减少与PSI区域相关联的电损耗。结果,所提出的复合微图案对于许多固态照明应用(例如发光二极管)可能具有吸引力。

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