Promoted diffusion mechanism of Fe2.7wt.%Si-Fe10wt.%Si couples under magnetic field by atomic-scale observations

摘要

Diffusion behavior of newly designed Fe2.7wt.%Si-Fe10wt.%Si couples at 1100?°C for up to 12?h has been investigated under the 0, 0.8 and 3?T magnetic fields. Diffusion thickness of solid solution layer and weight percent of Si on Fe2.7wt.%Si side increase significantly under a magnetic field. Application of a magnetic field promotes the diffusion of solid solution layer through the possible diffusion of vacancies mainly due to the appearance of defects, which has been demonstrated by the increased dislocation density and broadening of the typical XRD peaks. Replacement of Si sits by Fe atoms in the crystal structure leads to the appearance of Fe diffraction peaks, which has been confirmed by the increased interplanar spacings under a magnetic field. The magnetic field benefits the depinning of dislocations and leads to higher dislocation density because of the magnetoplastic effect which has been confirmed by the significantly reduced thickness of Fe2.7wt.%Si. Nano-sized Fesub3/subSi particles precipitate in the matrix with an orientation relationship on Fe10wt.%Si side as {220}subFe3Si/sub {220}submatrix/sub &??1-10?subFe3Si/sub ??1-10?submatrix/sub. Fesub3/subSi particles pin dislocation moving and lead to higher dislocation density.