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首页> 外文期刊>RSC Advances >Comparison of hydrogen, halogen, and tetrel bonds in the complexes of HArF with YH3X (X = halogen, Y = C and Si)
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Comparison of hydrogen, halogen, and tetrel bonds in the complexes of HArF with YH3X (X = halogen, Y = C and Si)

机译:氢,卤素和四键与YH3x的络合物中的氢,卤素和四键的比较(X =卤素,Y = C和Si)

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Ab initio MP2/aug-cc-pVTZ calculations were performed in order to find equilibrium structures with Y?F tetrel bonds, X?H hydrogen bonds or X?F halogen bonds on the potential energy surfaces of the complexes formed between HArF and YH _(3) X (X = halogen, Y = C and Si). For the CH _(3) X complexes, the hydrogen-bonded complex is the most stable, while the tetrel-bonded complex is the most stable of the SiH _(3) X complexes. The H–Ar stretch vibration exhibits a red shift for the hydrogen bond but a blue shift for the tetrel and halogen bonds. The hydrogen bonds in the CH _(3) X and SiH _(3) X complexes, as well as the tetrel bonds in the SiH _(3) X complexes, are governed by a combination of electrostatic and polarization energies, exhibiting partially covalent character with negative energy densities and a substantial amount of charge transfer.
机译:进行AB Initio MP2 / AUG-CC-PVTZ计算,以便在yΔftelel键上找到与yΔftelel键的平衡结构,x≤h氢键或x≤f卤素键在Harf和yh _之间形成的络合物的潜在能量表面上(3)X(X =卤素,Y = C和Si)。对于CH _(3)X复合物,氢键复合物是最稳定的,而丝带粘合复合物是SIH _(3)X复合物中最稳定的复合物。 H-AR拉伸振动表现出氢键的红色转变,但为椭圆和卤素键的蓝色转变。 CH _(3)x和SiH _(3)X复合物中的氢键,以及SIH _(3)X复合物中的四键键,由静电和偏振能量的组合来控制,表现出部分共价具有负能量密度的特征和大量的电荷转移。

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