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首页> 外文期刊>International Journal of Molecular Sciences >Hyperspectral Reflectance of Light-Adapted Leaves Can Predict Both Dark- and Light-Adapted Chl Fluorescence Parameters, and the Effects of Chronic Ozone Exposure on Date Palm ( Phoenix dactylifera )
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Hyperspectral Reflectance of Light-Adapted Leaves Can Predict Both Dark- and Light-Adapted Chl Fluorescence Parameters, and the Effects of Chronic Ozone Exposure on Date Palm ( Phoenix dactylifera )

机译:轻度适应叶子的高光谱反射率可以预测深度和光适应的CHL荧光参数,以及慢性臭氧暴露在枣棕榈(凤凰丁胺)的影响

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摘要

High-throughput and large-scale measurements of chlorophyll a fluorescence (ChlF) are of great interest to investigate the photosynthetic performance of plants in the field. Here, we tested the capability to rapidly, precisely, and simultaneously estimate the number of pulse-amplitude-modulation ChlF parameters commonly calculated from both dark- and light-adapted leaves (an operation which usually takes tens of minutes) from the reflectance of hyperspectral data collected on light-adapted leaves of date palm seedlings chronically exposed in a FACE facility to three ozone (O 3 ) concentrations (ambient air, AA; target 1.5 × AA O 3 , named as moderate O 3 , MO; target 2 × AA O 3 , named as elevated O 3 , EO) for 75 consecutive days. Leaf spectral measurements were paired with reference measurements of ChlF, and predictive spectral models were constructed using partial least squares regression. Most of the ChlF parameters were well predicted by spectroscopic models (average model goodness-of-fit for validation, R 2 : 0.53–0.82). Furthermore, comparing the full-range spectral profiles (i.e., 400–2400 nm), it was possible to distinguish with high accuracy (81% of success) plants exposed to the different O 3 concentrations, especially those exposed to EO from those exposed to MO and AA. This was possible even in the absence of visible foliar injury and using a moderately O 3 -susceptible species like the date palm. The latter view is confirmed by the few variations of the ChlF parameters, that occurred only under EO. The results of the current study could be applied in several scientific fields, such as precision agriculture and plant phenotyping.
机译:叶绿素(CHLF)的高通量和大规模测量荧光(CHLF)对探讨该领域的植物的光合性能非常感兴趣。在这里,我们测试能力快速,精确地,同时估计通常计算的脉冲幅度调制CHLF参数的数量,距离高光谱的反射率(通常需要几十分钟)的脉冲幅度调制CHLF参数的数量收集的数据在枣棕榈幼苗的轻质叶片,长期暴露在面部设施中至三个臭氧(O 3)浓度(环境空气,AA;靶1.5×AA O 3,命名为中等O 3,Mo;目标2×AA o 3,连续75天被命名为升高的O 3,EO)。叶谱测量与CHLF的参考测量配对,并且使用部分最小二乘回归构建预测光谱模型。大多数CHLF参数通过光谱型号良好预测(平均模型适合验证,R 2:0.53-0.82)。此外,比较全范围谱谱(即,400-2400nm),可以以高精度(81%的成功)植物区分暴露于不同的O 3浓度,特别是暴露于暴露于暴露于eo的植物莫和aa。即使在没有可见的叶状损伤并且使用像日期棕榈的中等o 3--pspseply的物种,也是可能的。后者视图通过CHLF参数的几个变化来确认,仅在EO下发生。目前研究的结果可应用于几种科学领域,例如精密农业和植物表型。

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