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One-dimensional hexagonal boron nitride conducting channel

机译:一维六边形氮化硼导通通道

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摘要

Hexagonal boron nitride (hBN) is an insulating two-dimensional (2D) material with a large bandgap. Although known for its interfacing with other 2D materials and structural similarities to graphene, the potential use of hBN in 2D electronics is limited by its insulating nature. Here, we report atomically sharp twin boundaries at AA′/AB stacking boundaries in chemical vapor deposition–synthesized few-layer hBN. We find that the twin boundary is composed of a 6′6′ configuration, showing conducting feature with a zero bandgap. Furthermore, the formation mechanism of the atomically sharp twin boundaries is suggested by an analogy with stacking combinations of AA′/AB based on the observations of extended Klein edges at the layer boundaries of AB-stacked hBN. The atomically sharp AA′/AB stacking boundary is promising as an ultimate 1D electron channel embedded in insulating pristine hBN. This study will provide insights into the fabrication of single-hBN electronic devices.
机译:六边形氮化硼(HBN)是具有大带隙的绝缘二维(2D)材料。虽然已知其与其他2D材料的与石墨烯的结构相似,但是通过其绝缘性质限制了2D电子器件中HBN的潜在使用。这里,我们在化学气相沉积的AA'/ AB堆叠边界中报告原子尖锐的双界 - 合成的少数层HBN。我们发现双边界由6'6'配置组成,显示具有零带隙的导电功能。此外,通过基于AB堆叠HBN的层边界的观察结果,通过与AA'/ AB的堆叠组合进行类比的堆叠组合来提出原子尖锐双界的形成机制。原子上尖锐的AA'/ AB堆叠边界是有前途的,作为嵌入在绝缘原始HBN中的终极1D电子通道。本研究将提供对单HBN电子设备的制造的见解。

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