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Micromechanism Study of Strengthening Effect of Copper on Gold Thiosulfate Leaching

机译:铜对金硫代硫酸盐浸出的加强效应的微观机制研究

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To study the effect of copper on gold thiosulfate leaching, the gold dissolution of three different sample powders (gold, gold/copper, and gold/copper oxide) in a solution of 5 mM Cu~(2+), 0.4 M ammonia, and 0.1 M thiosulfate was studied. Scanning electron microscopy analysis showed no sulfur passivation on the gold surface, and there were more prominent corrosion pits on the gold surfaces of samples that were ground with copper or copper oxide. The Evans diagrams showed that copper and copper oxide can promote both the anode and cathode processes of gold dissolution. Based on first principle simulations, copper and copper oxide exhibited the ability to disrupt the stability of gold surface atoms and cause different degrees of relaxation. Both copper and copper oxide reduce the d-band center of the gold surface atoms and the adsorption between gold and thiosulfate. In addition, the bond length of the S–S bond of thiosulfate adsorbed onto the gold surface was longer when copper or copper oxide were not present. According to the change in the potential surface energy, the energy barriers for gold atom dissolution from gold, gold/copper, and gold/copper oxide surfaces were 1.79, 0.72, and 1.01 eV, respectively.
机译:为了研究铜对金硫代硫酸盐浸出的影响,三种不同样品粉末(金,金/铜和金/氧化铝)的金溶解在5mM Cu〜(2+),0.4M氨和研究了0.1米硫代硫酸盐。扫描电子显微镜分析显示在金表面上没有硫钝化,并且在用铜或氧化铜研磨的样品的金表面上存在更显着的腐蚀坑。埃文斯图表明,铜和氧化铜可以促进金溶解的阳极和阴极过程。基于第一原理模拟,铜和氧化铜表现出破坏金表面原子稳定性并引起不同程度的弛豫的能力。铜和氧化铜均减少金表面原子的D频段中心和金和硫代硫酸盐之间的吸附。另外,当不存在铜或氧化铜时,吸附在金表面上的硫代硫酸酯的S-S键的键长度较长。根据潜在表面能的变化,金原子溶解来自金,金/铜和金/氧化铜表面的金原子溶解度分别为1.79,0.72和1.01eV。

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