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The Source of Overlay Masking in the Human Visual System

机译:人类视觉系统中覆盖遮罩的来源

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The cortical response to an oriented pattern is influenced by the superimposition of a pattern of orthogonal orientation. This phenomenon, termed overlay masking (alternatively, cross-orientation suppression), manifests as a reduction in effective contrast that could be attributed to either primarily cortical or subcortical mechanisms. Here, we used source- imaged electroencephalography (EEG) to identify the source of overlay masking in the human visual system. We measured the response of neurons in primary visual cortex (V1) to an oriented test component of varying contrast, and examined how this response was altered by the superimposition of an orthogonal mask presented to the same eye (monoptic) or different eye (dichoptic). We found that a monoptic mask changed the effective contrast of the test component, consistent with overlay masking, while a dichoptic mask preserved the effective contrast of the test component and hence circumvented overlay masking. Given that dichoptic presentation precludes subcortical interactions between components, we identify subcortical mechanisms as the primary source of overlay masking in the human visual system.
机译:皮质对定向图案的响应受正交定向图案的叠加影响。这种现象被称为覆盖遮罩(替代地,交叉取向抑制),表现为有效对比度的下降,这可能归因于主要是皮层或皮层下的机制。在这里,我们使用了源图像脑电图(EEG)来识别人类视觉系统中重叠蒙版的来源。我们测量了主视皮层(V1)中神经元对不同对比度的定向测试组件的响应,并检查了如何通过在同一只眼睛(单眼)或另一只眼睛(双眼)上叠加正交蒙版来改变此响应。我们发现,单向掩膜改变了测试组件的有效对比度,与覆盖蒙版一致,而两向遮罩则保留了测试组件的有效对比度,从而避免了覆盖蒙版。鉴于二尖瓣表现排除了组件之间的皮层下相互作用,我们将皮层下机制确定为人类视觉系统中覆盖遮罩的主要来源。

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