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Drain Current Modulation of a Single Drain MOSFET by Lorentz Force for Magnetic Sensing Application

机译:洛仑兹力对单漏极MOSFET的漏极电流调制用于磁传感应用

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This paper reports a detailed analysis of the drain current modulation of a single-drain normal-gate n channel metal-oxide semiconductor field effect transistor (n-MOSFET) under an on-chip magnetic field. A single-drain n-MOSFET has been fabricated and placed in the center of a square-shaped metal loop which generates the on-chip magnetic field. The proposed device designed is much smaller in size with respect to the metal loop, which ensures that the generated magnetic field is approximately uniform. The change of drain current and change of bulk current per micron device width has been measured. The result shows that the difference drain current is about 145 μA for the maximum applied magnetic field. Such changes occur from the applied Lorentz force to push out the carriers from the channel. Based on the drain current difference, the change in effective mobility has been detected up to 4.227%. Furthermore, a detailed investigation reveals that the device behavior is quite different in subthreshold and saturation region. A change of 50.24 μA bulk current has also been measured. Finally, the device has been verified for use as a magnetic sensor with sensitivity 4.084% (29.6 T ?1 ), which is very effective as compared to other previously reported works for a single device.
机译:本文报告了在片上磁场下对单漏极正栅极n沟道金属氧化物半导体场效应晶体管(n-MOSFET)的漏极电流调制的详细分析。已经制造了单漏极n-MOSFET,并将其放置在产生芯片上磁场的方形金属环路的中心。相对于金属回路,所提出的设计的装置在尺寸上要小得多,这确保了所产生的磁场近似均匀。已经测量了每微米器件宽度的漏极电流变化和体电流变化。结果表明,对于最大施加磁场,漏极电流差约为145μA。这种变化是由于所施加的洛伦兹力将载流子从通道推出而引起的。根据漏极电流差,可以检测到有效迁移率的变化高达4.227%。此外,详细的调查显示,在亚阈值和饱和区域,器件的性能差异很大。还测量了50.24μA的体积电流变化。最终,该设备已被验证可以用作灵敏度为4.084%(29.6 T?1)的磁传感器,与先前针对单个设备进行的其他报道相比,该设备非常有效。

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