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首页> 外文期刊>RSC Advances >Observing the three-dimensional terephthalic acid supramolecular growth mechanism on a stearic acid buffer layer by molecular simulation methods
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Observing the three-dimensional terephthalic acid supramolecular growth mechanism on a stearic acid buffer layer by molecular simulation methods

机译:用分子模拟方法观察硬脂酸缓冲层上三维对苯二甲酸超分子生长机理

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The terephthalic acid (TPA) supramolecular growth mechanisms on the stearic acid (STA) buffer layer, such as the phase separation and layer-by-layer (LBL) mechanisms, were considered by molecular simulations. The electrostatic surface potential (ESP) charges obtained by the semi-empirical ab initio package VAMP with PM6 were used with the Dreiding force field. The stochastic tunneling-basin hopping-discrete molecular dynamics method (STUN-BH-DMD) was first used to construct the most stable STA buffer layers (STA100, STA120, and STA140) on graphene. At STA100 and STA120, the STA molecule stacking along their long axis is the major mechanism to obtain the stable STA buffer layer. At STA140, the hydrogen bond network between the terminal COOH groups of STA molecules makes the STA buffer layer the most stable, leading to a higher disintegration temperature among all STA coverages. In the early growth of the TPA supramolecule, TPA molecules were first adsorbed by the holes between STA piles. At STA100 and STA120, the subsequent TPA molecules were adsorbed by the TPA molecules within the holes, leading to the phase separation growth. At STA140, the TPA supramolecule tends to grow by the LBL mechanism.
机译:通过分子模拟考虑了硬脂酸(STA)缓冲层上的对苯二甲酸(TPA)超分子生长机理,例如相分离和逐层(LBL)机理。通过具有PM6的半经验从头开始封装VAMP获得的静电表面电势(ESP)电荷与Dreiding力场一起使用。随机隧穿盆地跳跃离散分子动力学方法(STUN-BH-DMD)首先用于在石墨烯上构建最稳定的STA缓冲层(STA100,STA120和STA140)。在STA100和STA120,STA分子沿其长轴堆积是获得稳定STA缓冲层的主要机制。在STA140,STA分子的末端COOH基团之间的氢键网络使STA缓冲层最稳定,从而导致在所有STA覆盖范围内更高的崩解温度。在TPA超分子的早期生长中,TPA分子首先被STA桩之间的孔吸附。在STA100和STA120,随后的TPA分子被孔内的TPA分子吸附,导致相分离的增长。在STA140,TPA超分子倾向于通过LBL机制生长。

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