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The evolution of skyrmions in Ir/Fe/Co/Pt multilayers and their topological Hall signature

机译:Ir / Fe / Co / Pt多层薄膜中天体离子的演变及其霍尔拓扑特征

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The topological Hall effect (THE) is the Hall response to an emergent magnetic field, a manifestation of the skyrmion Berry-phase. As the magnitude of THE in magnetic multilayers is an open question, it is imperative to develop comprehensive understanding of skyrmions and other chiral textures, and their electrical fingerprint. Here, using Hall-transport and magnetic-imaging in a technologically viable multilayer film, we show that topological-Hall resistivity scales with the isolated-skyrmion density over a wide range of temperature and magnetic-field, confirming the impact of the skyrmion Berry-phase on electronic transport. While we establish qualitative agreement between the topological-Hall resistivity and the topological-charge density, our quantitative analysis shows much larger topological-Hall resistivity than the prevailing theory predicts for the observed skyrmion density. Our results are fundamental for the skyrmion-THE in multilayers, where interfacial interactions, multiband transport and non-adiabatic effects play an important role, and for skyrmion applications relying on THE.
机译:拓扑霍尔效应(THE)是霍尔对出现的磁场的响应,该磁场是天生的贝里相的体现。由于磁性多层膜中THE的大小是一个悬而未决的问题,因此必须全面理解天rm子和其他手性结构及其电指纹。在这里,在技术上可行的多层膜中使用霍尔传输和磁成像技术,我们显示拓扑霍尔电阻率在宽温度和磁场范围内随分离的斯密离子密度而变化,证实了斯密离子Berry-电子运输阶段。当我们在拓扑-霍尔电阻率和拓扑电荷密度之间建立定性协议时,我们的定量分析显示,拓扑-霍尔电阻率比现行理论对观测到的披肩离子密度要大得多。我们的结果对于多层的Skyrmion-THE具有至关重要的作用,其中界面相互作用,多频带传输和非绝热效应起着重要作用,而对于依赖THE的Skyrmion应用也是如此。

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