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Bandgap renormalization and work function tuning in MoSe2/hBN/Ru(0001) heterostructures

机译:MoSe 2 / hBN / Ru(0001)异质结构中的带隙重整化和功函数调整

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The van der Waals interaction in vertical heterostructures made of two-dimensional (2D) materials relaxes the requirement of lattice matching, therefore enabling great design flexibility to tailor novel 2D electronic systems. Here we report the successful growth of MoSe2 on single-layer hexagonal boron nitride (hBN) on the Ru(0001) substrate using molecular beam epitaxy. Using scanning tunnelling microscopy and spectroscopy, we found that the quasi-particle bandgap of MoSe2 on hBN/Ru is about 0.25?eV smaller than those on graphene or graphite substrates. We attribute this result to the strong interaction between hBN/Ru, which causes residual metallic screening from the substrate. In addition, the electronic structure and the work function of MoSe2 are modulated electrostatically with an amplitude of ~0.13?eV. Most interestingly, this electrostatic modulation is spatially in phase with the Moiré pattern of hBN on Ru(0001) whose surface also exhibits a work function modulation of the same amplitude.
机译:由二维(2D)材料制成的垂直异质结构中的范德华相互作用使对晶格匹配的要求放宽,因此能够为定制新型2D电子系统提供极大的设计灵活性。在这里,我们报道了使用分子束外延在Ru(0001)衬底上的单层六方氮化硼(hBN)上成功地生长了MoSe 2 。使用扫描隧道显微镜和光谱学,我们发现在hBN / Ru上MoSe 2 的准粒子带隙比在石墨烯或石墨基板上的准粒子带隙小0.25µeV。我们将此结果归因于hBN / Ru之间的强相互作用,这会导致从基材上残留金属。另外,MoSe 2 的电子结构和功函数被静电调制,幅度为〜0.13?eV。最有趣的是,这种静电调制在空间上与Ru(0001)上hBN的莫尔图案同相,其表面也表现出相同幅度的功函数调制。

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