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Prospective field emitters for miniature high voltage electronic devices operating at technical vacuum conditions

机译:适用于在真空条件下运行的微型高压电子设备的预期场致发射器

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The use of field emitters is promising for the creationof systems for formation of electron flows in many elec-tronic devices, since they do not require heating and areinertialess. Until recently, the field emitters were usedmainly in ultra-high vacuum, low current and low voltagedevices. Meanwhile, miniature, but high voltage electron-ic devices, which it is difficult to use with thermioniccathodes, are attracting more and more interest. Such are,for example, electron-beam microwave devices of shortmillimeter and sub-millimeter wavelengths, as well asminiature X-ray sources, operating at accelerating voltag-es of units - tens kV. Emission currents of several tensmilliamps at current densities of the order of or more than100–150 mA/cm 2 , are required, as a rule in these applica-tions. Not only the difficulty of sufficiently high currentsproducing by field emitters, but also their low durabilityimpedes their use in high voltage devices. Basic mechan-isms of cathodes destruction are associated with an in-tense bombardment of their surface by residual gas ionstypical for such devices, with the impact of ponderomo-tive forces, large in strong electric fields, and/or by thethermal effects at the selection of the large emission cur-rents. Using distributed systems as field emitters allowsto facilitate the current load on the single emission center,minimize the effect of ponderomotive forces and thermaleffects. However usually, ion bombardment restricts theuse of field emitters in high-voltage electronic devices.
机译:场发射器的使用有望在许多电子设备中创建用于形成电子流的系统,因为它们不需要加热且无惯性。直到最近,场发射器仍主要用于超高真空,低电流和低压设备中。同时,难以与热电子阴极一起使用的微型但高压电子设备引起越来越多的关注。例如,短波长和亚毫米波长的电子束微波设备,以及微型X射线源,它们以数十伏的单位加速电压工作。在这些应用中,通常要求发射密度为几十毫安的电流,电流密度应大于或等于100–150 mA / cm 2。场发射器不仅难以产生足够高的电流,而且其耐用性低,也阻碍了它们在高压设备中的使用。阴极破坏的基本机理与此类设备的典型残余气体离子,强动力的影响,强电场中的大影响和/或选择时的热效应对表面的强烈轰击有关。的大排放电流。使用分布式系统作为场发射器可以简化单个发射中心的电流负荷,最大程度地减小磁动力和热效应的影响。但是,通常,离子轰击会限制高压电子设备中场发射器的使用。

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