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Optical Characterization of Transmitted Visible Photoluminescence of Bragg‐resonanced Porous Silicon

机译:布拉格共振多孔硅的透射可见光致发光的光学表征

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摘要

The investigation and optical characterization of Bragg resonance luminescence porous silicon (BRL PS) exhibiting both optical reflectivity and sharp photoluminescence (PL) at the Bragg resonance wavelength were reported. Two types of Bragg reflector porous silicon (BR PS) samples which exhibit strong reflection in visible or near infrared region and broad red PL were fabricated. When the Bragg reflection wavelength places in the range of emission wavelength, BR PS starts to exhibit narrowing of PL behavior. The optimization of Bragg resonance phenomenon of PL to generate sharp Bragg‐resonated PL by changing the number of repeats of Bragg‐stack layers. BR PS showing the reflection wavelength of 640 nm with 50 repeats exhibited sharp PL at the Bragg resonance wavelength with broad weak PL. BRL PS having 70% porosity with 1.45 refractive index displayed the second‐order reflectivity peak at 640 nm, thus sharp PL peak at 640 nm was the second‐order transmitted and amplified PL peak at the Bragg resonance wavelength. The optical properties of free‐standing BR PS film were investigated. The front side surface of BR PS shows both reflectivity and PL, however the back side surface of free‐standing BR PS shows only reflectivity without PL.
机译:报道了布拉格共振发光多孔硅(BRL PS)在布拉格共振波长下具有光反射率和尖锐光致发光(PL)的研究和光学特性。制备了两种类型的布拉格反射器多孔硅(BR PS)样品,它们在可见光或近红外区域显示强反射,并显示宽红色PL。当布拉格反射波长处于发射波长范围内时,BR PS开始表现出PL行为变窄。通过更改布拉格堆叠层的重复次数,优化PL的布拉格共振现象以生成清晰的布拉格共振PL。 BR PS显示640 nm的反射波长,重复50次,在布拉格共振波长显示PL宽,PL弱。孔隙率为70%,折射率为1.45的BRL PS在640 nm处显示第二级反射峰,因此在640 nm处的PL峰是在布拉格共振波长处的第二级透射和放大PL峰。研究了独立式BR PS膜的光学性能。 BR PS的正面显示反射率和PL,但是独立式BR PS的背面仅显示反射率而没有PL。

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