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首页> 外文期刊>Journal of the Serbian Chemical Society >Semiconducting properties of oxide films formed onto an Nb electrode in NaOH solutions
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Semiconducting properties of oxide films formed onto an Nb electrode in NaOH solutions

机译:在NaOH溶液中在Nb电极上形成的氧化膜的半导体特性

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In this paper, the results of the potentiostatic formation of homogeneous and heterogeneous, nano-crystalline passive films of Nb2O5 onto an Nb electrode in NaOH solutions of different concentrations at potentials lower than 3.0 V vs. SCE are presented. The semiconducting properties of such films were investigated by EIS measurements. After fitting the EIS results by appropriate equivalent circuits, the space charge capacitance (Csc) and space charge resistance (Rsc) of these films were determined. The donor density (Nsc), flat band potential (Efb) and thickness of the space charge layer (dsc) for such oxide films were determined from the corresponding Mott-Schottky (M-S) plots. It is shown that all oxide films were n-type semiconductors in a certain potential range.
机译:在本文中,介绍了在浓度低于3.0 V(相对于SCE)的NaOH溶液中,Nb2O5在Nb电极上形成均匀且非均质的Nb2O5纳米晶钝化膜的恒电位形成结果。通过EIS测量研究了此类薄膜的半导体性能。通过适当的等效电路拟合EIS结果后,确定这些薄膜的空间电荷电容(Csc)和空间电荷电阻(Rsc)。从相应的Mott-Schottky(M-S)图确定了这种氧化物膜的施主密度(Nsc),平坦带电势(Efb)和空间电荷层的厚度(dsc)。结果表明,在一定的电位范围内,所有的氧化膜都是n型半导体。

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