Chemical vapour deposition of diamond using low pressure flat combustion flame

摘要

Diamond coatings were deposited onto Mo and WC-Co substrates using a low pressure premixed acetylene-oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of ?7 cm2 onto Mo substrates, the coating thickness after 1 h deposition amounted to ?1 μm. Upon machining an Al-12 % Si alloy under identical conditions, the diamond coated WC-Co cutting tool inserts showed 30 % less wear than the as-received inserts.