REACTIVE EVAPORATION OF TiO 2 AND SiO 2 FILMS FOR MULTILAYER COATINGS

摘要

The optinzum deposition parameters for Tio2 and SiO2 films for the multilayer coatings are reported. The influence of residual pressure of oxygen in the range of 10 -4-10-5 torr, rate of evaporation between 1 and 22 A sec-1 and different oxides of titaniu