Ultraviolet (UV) nanoimprint lithography1-6) is used to fabricate nanostructured devices with high-throughput, low cost, and high resolution. Mold is usually coated with an antisticking layer (ASL) to separate from the resin after nanoinprinting. Therefore, the ASL is one of the important factors in nanoimprinting. Furthermore, the thin ASL is required because the patterns on the mold become smaller and smaller. For example, when the line- and space-widths are 10nm, line- and space-widths become 12nm and 8nm after coating the ASL of 1nm thick, as shown in Fig. 1. This means that the ASL thickness affects the ultrafine-pattern size.
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