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Multiple Roughness Characteristics of Chemically Deposited Ni-P-W Coatings

机译:化学沉积Ni-P-W涂层的多重粗糙度特征

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This paper presents an experimental study of multiple roughness characteristics of Ni-P-W coatings on a mild steel substrate. The different roughness parameters considered are centre line average roughness (Ra), root mean square roughness (Rq), skewness (Rsk), kurtosis (Rku) and mean line peak spacing (Rsm). The aim of the present study is to optimize the coating process parameters based on Taguchi method and Grey relational analysis in order to obtain the particular bath composition which may be used to deposit Ni-P-W coatings with optimum roughness characteristics. Experiments are carried out based on the L27 Taguchi orthogonal designusing the combination of three process parameters, namely, concentration of tungsten ion, concentration of reducing agent and concentration of nickel source. It is observed that concentration of tungsten ion has the most significant influence in controlling roughness characteristics of Ni-P-W coating. The surface morphology, composition and phase structure of coatings are also studied with the help of scanning electron microscopy, energy dispersive X-ray analysis and X-ray diffraction analysis respectively
机译:本文介绍了在低碳钢基底上的Ni-P-W涂层的多种粗糙度特征的实验研究。考虑的不同粗糙度参数是中心线平均粗糙度(Ra),均方根粗糙度(Rq),偏度(R​​sk),峰度(Rku)和平均线峰间距(Rsm)。本研究的目的是基于Taguchi方法和灰色关联分析来优化镀膜工艺参数,以获得可用于沉积具有最佳粗糙度特性的特殊镀液成分。基于L27 Taguchi正交设计,使用三个工艺参数(钨离子浓度,还原剂浓度和镍源浓度)的组合进行了实验。可以看出,钨离子的浓度对控制Ni-P-W镀层的粗糙度特性影响最大。借助扫描电子显微镜,能量色散X射线分析和X射线衍射分析分别研究了涂层的表面形态,组成和相结构。

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