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Local transverse coupling impedance measurements in a synchrotron light source from turn-by-turn acquisitions

机译:通过逐行采集获得的同步加速器光源中的局部横向耦合阻抗测量

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摘要

Transverse beam coupling impedance is a source of beam instabilities that limits the machine performance in circular accelerators. Several beam based techniques have been used to measure the transverse impedance of an accelerator, usually based on the optics distortion produced by the impedance source itself. Beam position monitor turn-by-turn analysis for impedance characterization has been usually employed in large circumference machines, while synchrotron light sources have mainly used slow orbit based techniques. Instead, the work presented in this paper uses for the first time turn-by-turn data at ALBA to advance the measurement technique into the range of the typically small impedance values of modern light sources. We have measured local impedance contributions through the observation of phase advance versus bunch charge using the betatron oscillations excited with a fast dipole kicker. The ALBA beam position monitor system and the precision of the turn-by-turn analysis allowed to characterize the main sources of transverse impedance, in good agreement with the model values, including the impedance of an in-vacuum undulator.
机译:横向光束耦合阻抗是光束不稳定性的根源,它限制了圆形加速器中的机器性能。通常基于阻抗源本身产生的光学畸变,已经使用了几种基于波束的技术来测量加速器的横向阻抗。在大周长机器中通常使用光束位置监视器逐匝分析来表征阻抗,而同步加速器光源则主要使用基于慢轨道的技术。取而代之的是,本文中介绍的工作首次使用ALBA的逐行扫描数据将测量技术推进到现代光源通常较小的阻抗值范围内。我们通过使用由快速偶极跳动器激发的电子感应加速器,通过观察相提前对束电荷来测量局部阻抗贡献。 ALBA光束位置监控器系统和逐行分析的精度可以表征横向阻抗的主要来源,与包括真空内起伏器阻抗在内的模型值非常吻合。

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