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Removal of anionic surfactant sodium dodecyl sulfate from aqueous solutions by O 3/UV/H 2O 2 advanced oxidation process: Process optimization with response surface methodology approach

机译:O 3 / UV / H 2 从水溶液中去除阴离子表面活性剂十二烷基硫酸钠O 2 高级氧化工艺:采用响应面方法的工艺优化方法

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This study investigates the removal of sodium dodecyl sulfate (SDS) by O 3 /UV/H 2 O 2 process. Response surface methodology based on central composite design was used to assess the effects of process parameters including initial pH, H 2 O 2 concentration, ozone dosage and reaction time on SDS removal. Analysis of variance showed that all parameters had significant effects on SDS removal. SDS removal increased significantly with increasing pH, ozone dosage and reaction time. Quadratic model was used for the response variable, i.e., SDS removal, and the predicted removal was 96%. Optimum conditions were obtained based on the performance of O 3 /UV/H 2 O 2 process in reaction time of 55?min, initial pH of 7.0, 10?mM?H 2 O 2 concentration and 10?mg?L ?1 ozone dosage. The model predictions were in an agreement with the experimental data with a deviation less than 2%.
机译:本研究研究了通过O 3 / UV / H 2 O 2工艺去除十二烷基硫酸钠(SDS)的方法。基于中央复合设计的响应面方法被用于评估工艺参数(包括初始pH,H 2 O 2浓度,臭氧剂量和反应时间)对SDS去除的影响。方差分析表明,所有参数均对SDS去除具有显着影响。随着pH值,臭氧剂量和反应时间的增加,SDS的去除量显着增加。将二次模型用于响应变量,即SDS去除,预计去除率为96%。根据O 3 / UV / H 2 O 2工艺的性能,在55?min的反应时间,7.0的初始pH,10?mM?H 2 O 2的浓度和10?mg?L?1的臭氧条件下获得了最佳条件。剂量。模型预测与实验数据一致,偏差小于2%。

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