Simultaneously thermionic vacuum arc discharges in obtaining ferromagnetic thin films

摘要

High quality granular ferromagnetic thin films on glass and silicon wafer substrateswere obtained using the original thermionic vacuum arc (TVA) method developed at NationalInstitute for Laser, Plasma and Radiation Physics. We report obtaining of 77-200 nm thick Cu/Ni/Festructures. An experimental set-up, with three simultaneously discharges, was made to obtain thedesired thin film composition and thickness.The structural and morphological properties of the prepared nanostructured films wereanalyzed by AFM (Atomic Force Microscopy), XRD (X-ray Diffraction) and SEM (ScanningElectron Microscopy). Magneto-Optical Kerr Effect studies were made in order to infer the changesin polarization of an optical radiation due to the magnetic field influence. In order to obtainconcluding electrical measurements results, cooper electrodes were deposited using the same methodbefore and after the actual three material thin structures. In this way significant changes in theelectrical resistance behavior were noticed and were correlated with TVA plasma parameters used forfilm preparation.